Lithography

Check the NanoFab Wiki for the most updated instrumentation.

Photoresists and Lithography Chemicals

• See the Chemical Datasheets page.
• Auto. Coat/Develop (S-Cubed Flexi)

Contact Aligners (Optical Exposure)

• Contact Aligners (SUSS MJB-3)
• Contact Aligner (SUSS MA-6)
• DUV Flood Expose

Direct-Write Lithography

• E-Beam Lithography System (JEOL JBX-6300FS)
• E-Beam Lithography (FEI Sirion Nabity v9)
• Focused Ion-Beam Lithography (Raith Velion)
• Maskless Aligner (Heidelberg MLA150)

Other Patterning Systems

• Holographic Litho/PL Setup (Custom)

Steppers (Optical Exposure)

• Stepper 1 (GCA 6300, i-line)
• Stepper 2 (AutoStep 200, i-line)
• Stepper 3 (ASML DUV, Deep-UV)

Thermal Processing for Photolithography

• Ovens - Overview of all lab ovens
• Ovens 1, 2 & 3 (Labline)
• Oven 4 (Fisher)
• Oven 5 (Labline)
• High Temp Oven (Blue M)

Lithography Support

• The Spinner Bencheshave pre-set hotplates at various temperatures appropriate for common photoresist bakes.
• POLOS spinners on Develop and Solvent benches
• Spin/Rinse/Dryer