Reactive Ion Etching (RIE); Plasma Etching and Cleaning; Etch Monitoring; ICP-RIE; Ion Milling and Reactive Ion Beam Etching; Other Dry Etching
Nanotech supports nanofabrication research by providing tools and training for academic institutions, industries, and government agencies. The facility features 12,700 square feet of clean room space to do research using state-of-the-art equipment and offers a wide-range of capabilities.
A full list of instrumentation can be found here: Tool List - UCSB Nanofab Wiki
Reactive Ion Etching (RIE); Plasma Etching and Cleaning; Etch Monitoring; ICP-RIE; Ion Milling and Reactive Ion Beam Etching; Other Dry Etching
Optical Microscopy; Electron Microscopy; Topographical Metrology; Thickness + Optical Constants; Electrical Analysis; Other Properties
Photoresists and Lithography Chemicals; Contact Aligners (Optical Exposure); Direct-Write Lithography; Other Patterning Systems; Steppers (Optical Exposure); Thermal Processing for Photolithography; Lithography Support
Die Singulation / Down-sizing; Other Packaging; Wafer/Die Bonding
Check the NanoFab Wiki for the most updated instrumentation.
Thermal Evaporation; Sputter Deposition; Chemical Vapor Deposition (CVD)
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.